Peter Trefonas (born 1958) is a DuPont Fellow (a senior scientist) at DuPont, where he works on the development of electronic materials. He is known for innovations in the chemistry of photolithography, particularly the development of anti-reflective coatings and polymer photoresists that are used to create circuitry for computer chips. This work has supported the patterning of smaller features during the lithographic process, increasing miniaturization and microprocessor speed.
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1958 (age 67) Minneapolis, Minnesota, U.S.
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